6th International Conference on
Hotel SB BCN Events, Barcelona, Spain
Electron Beam Lithography (EBL) is a fundamental technique of nanofabrication, allowing not only the direct writing of structures down to sub-10 nm dimensions, but also enabling high volume Nano scale patterning technologies such as (DUV and EUV). The principal micro- and nanofabrication techniques are described, involve photolithography, soft lithography, film deposition, etching, bonding, molecular Self assembly , electrically induced Nano patterning, rapid prototyping, and electron, X-ray, colloidal monolayer, and focused ion beam lithography.
Related Tags : Nissan Maxima Schematic, Horizon Fuel Cell Technologies, Functionalized Nanomaterials, Cmc textile, Nanoparticles, IEEE NANO, International Online Conference on Nano Materials , Nanomaterials for Sustainable Development, Ieee nanotechnology conference, Nanomaterials conference 2022
Related Association : Nanotechnology Research – Associations – Nanowerk, Nano Technology Research Association, Nanotechnology: Ethics and Society, Society for Precision Engineering and Nanotechnology, National Nanotechnology Center (NANOTEC)
