Organizing Committee

Sarah Goehrke

Additive Integrity LLC,

Mozambique

Jinqiang Ning

Georgia Institute of Technology,

Mozambique

Vyacheslav R. Falikman

National Scientific Research Center,

Hawaii

Ludmila Kucerova

University of West Bohemia,

Bhutan

Lin Li

The University of Manchester,

Angola

Hans-Jörg Fecht

Ulm University,

North Korea

Karl-Heinz Gresslehner

University of Applied Sciences Upper Austria,

Luxembourg

Jingan Li

Zhengzhou University,

Vatican

Francisco Torrens

Universitat de Valencia,

Oklahoma

Ch. Sanjay

Gitam University ,

Turkey

Ehsan Kamani

Shohada University,

United Arab Emirates