Polymer Science and Nanotechnology

Electron Beam Lithography (EBL) is a fundamental technique of nanofabrication, allowing not only the direct writing of structures down to sub-10 nm dimensions, but also enabling high volume Nano scale patterning technologies such as (DUV and EUV). The principal micro- and nanofabrication techniques are described, involve photolithography, soft lithography, film deposition, etching, bonding, molecular Self assembly , electrically induced Nano patterning, rapid prototyping, and electron, X-ray, colloidal monolayer, and focused ion beam lithography.